Introducing Facilities in Intelligent Sensing Laboratory.
Molecular Beam Epitaxy System (MBE)
Molecular Beam Epitaxy (MBE) is an epitaxy method which can deposit a high-quality thin film of single crystals.
Thermal Evaporator
The thermal Evaporator is common deposition system that can deposit thin-film by evaporating the source material.
Gas Furnace
The gas furnace is annealing equipment for devices that need a thermal annealing process.
Physical vapor deposition (PVD)
This PVD consists of an e-beam evaporator and a sputtering system. It allows depositing a thin film of various metals, semiconductors, and dielectrics.
Metal-Organic Chemical Vapour Deposition (MOCVD)
The MOCVD chamber capable of growing III-N semiconductors such as GaN, BN, etc.
